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  4. Mechanisms of near ultraviolet nanosecond pulse–laser damage in HfO2/SiO2 based

Mechanisms of near ultraviolet nanosecond pulse–laser damage in HfO2/SiO2 based

上传者: 2021-04-16 23:25:48上传 PDF文件 1.62MB 热度 31次
The possible role of metal clusters and electronic defects in the near-ultraviolet, nanosecond-pulse–laser damage in HfO2/SiO2-pair-based coatings is analyzed using experimental results on absorption and damage in HfO2 monolayers with and without artificially introduced Hf nanoscale absorbers. These
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