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  4. 0.532 \mum laser conditioning of HfO2/SiO2 third harmonic separator fabricated b

0.532 \mum laser conditioning of HfO2/SiO2 third harmonic separator fabricated b

上传者: 2021-04-30 22:59:43上传 PDF文件 334.84KB 热度 25次
The 0.532-\mum laser conditioning of HfO2/SiO2 third harmonic separator fabricated by electron-beam evaporation (EBE) was studied. The laser induced damage threshold (LIDT) of the separator determined by 1-on-1 test is 9.1 J/cm2 and it is 15.2 J/cm2 after laser conditioning determined by raster scan
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