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Influences of SiO2 protective layers and annealing on the laser induced damage t

上传者: 2021-04-05 10:36:00上传 PDF文件 483.12KB 热度 22次
Ta2O5 films are prepared on BK7 substrates with conventional electron beam evaporation deposition. The effects of SiO2 protective layers and annealing on the laser-induced damage threshold (LIDT) of the films are investigated. The results show that SiO2 protective layers exert little influence on th
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