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Characterization of metal oxide thin films deposited by plasma assisted reactive

上传者: 2021-02-22 17:49:30上传 PDF文件 6.93MB 热度 28次
For single layers of SiO2, Nb2O5, and Ta2O5 that are deposited by plasma-assisted reactive magnetron sputtering (PARMS), we present measurement results for basic optical and mechanical properties, in particular, optical index, intrinsic film stress, thermal shift of spectral transmittance, and micro
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