Boron doped nanocrystalline silicon film characterization for solar cell applica

Lightly doped hydrogenated amorphous silicon thin films were deposited through the plasma enhanced chemical vapor deposition (PECVD) technique using a gas mixture of SiH4, B2H6, and H2 as the precursor. By using thermal annealing at 800 and 1000°C, boron doped nanocrystalline silicon films were obta