Thinning and polishing of cross section of depth graded WSi2/Si multilayer for l

A linear zone plate named multilayer laue lens (MLL) is fabricated using a depth-graded multilayer structure. The lens shows considerable potential in focusing an X-ray beam into a nanometer scale with high efficiency. In this letter, a depth-graded multilayer consisting of 324 alternating WSi2 and Si layers with a total thickness of 7.9 \mu m is deposited based on the thickness sequence according to the demands of the zone plate law. Subsequently, the multilayer sample is sliced and thinned to