Small d spacing WSi2/Si multilayers for X ray monochromators

A WSi2/Si multilayer, with 300 bi-layers and a 2.18-nm d-spacing, is designed for X-ray monochromator application. The multilayer is deposited using direct current magnetron sputtering technology. The reflectivity of the 1st-order Bragg peak measured at E=8.05 keV is 38%, and the angular resolution