Design of shallow etched multilayer dielectric grating with –1st order high diff

A new design of shallow-etched multilayer dielectric grating (MDG) exhibiting a diffraction efficiency (DE) of approximately 100% in the –1st order at 1064-nm wavelength in Littrow mounting is reported. Particle swarm optimization algorithm and Fourier modal method are used to design MDG and calculate the DE of MDG. The thickness of the grating layer is less than 80 nm which is much shallower than that in the currently reported MDG design for a high DE, which is greatly helpful for the MDG etchi