Evanescent wave imaging in optical lithography
Newapplicationsofevanescentimagingformicrolithographyareintroduced.Theuseofevanescentwavelithography(EWL)hasbeenemployedfor26nmresolutionat1.85NAusinga193nmArFexcimerlaserwavelengthtorecordimagesinaphotoresistwitharefractiveindexof1.71.Additionally,aphotomaskenhancementeffectisdescrib
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